Products — Vacuum Deposition & Plasma Chemistry Plants
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
$90,000-360,000
NIITM OJSC 🇷🇺
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
$90,000-300,000
NIITM OJSC 🇷🇺
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
$90,000-360,000
NIITM OJSC 🇷🇺
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
$90,000-300,000
NIITM OJSC 🇷🇺
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
$15,000-48,000
NIITM OJSC 🇷🇺
Post your Buy Requirement
Get Quotes from Verified Suppliers
Save Your Time
Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
$90,000-300,000
NIITM OJSC 🇷🇺
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
$90,000-360,000
NIITM OJSC 🇷🇺
Automated Ion-Plasma Coating System MAP-3
$90,000-360,000
National Research Center "Kurchatov Institute" - VIAM 🇷🇺
Continuous Vacuum Unit for Containers and Pipelines up to 1.2 m³ - GRSI.306586.002
$9,000-36,000
HERMES OJSC 🇷🇺
Anisotropic Plasma Etching System for Silicon Plates up to 200 mm – ESTOХORS
$90,000-360,000
ESTO OJSC 🇷🇺
Automated Coating System "MAP-2" for Ion-Plasma Coatings
$90,000-360,000
National Research Center "Kurchatov Institute" - VIAM 🇷🇺
