产品 — 真空镀膜与等离子化学设备
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
¥108,000-345,600
NIITM OJSC 🇷🇺
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Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Automated Ion-Plasma Coating System MAP-3
¥648,000-2,592,000
National Research Center "Kurchatov Institute" - VIAM 🇷🇺
Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Continuous Vacuum Unit for Containers and Pipelines up to 1.2 m³ - GRSI.306586.002
¥64,800-259,200
HERMES OJSC 🇷🇺
Anisotropic Plasma Etching System for Silicon Plates up to 200 mm – ESTOХORS
¥648,000-2,592,000
ESTO OJSC 🇷🇺
Automated Coating System "MAP-2" for Ion-Plasma Coatings
¥648,000-2,592,000
National Research Center "Kurchatov Institute" - VIAM 🇷🇺
Kepler Vacuum Coating System for Large-Scale Applications
¥648,000-2,592,000
DANA ENGINEERING LLC 🇷🇺
Microwave Plasma Chemical Reactor for Diamond Growth ARDIS 300
¥648,000-2,160,000
OPTOSISTEMY LLC 🇷🇺
