The Fermi vacuum sputtering platform is designed to create sputtering equipment for clean production facilities. Plants built on this platform are used in laboratories and small-scale production.
A key feature of this platform is the placement of process devices both on the side walls and doors of the vacuum chamber and on the bottom. Special configurations include an airlock loading chamber.
In this case, the substrates are placed on a rotating substrate holder. The vacuum chamber is either D-shaped or polyhedron-shaped.
Advantages
-The possibility of using several devices in one technological cycle: magnetron, electron beam evaporator, thermoresistive evaporator.
-All elements of the vacuum system are made of non-magnetic stainless steel of 12?18?10?/AISI321, 08?18?10/ AISI304 grades.
-Surfaces facing the vacuum are processed to roughness Ra0,8, which guarantees minimum degassing and, as a consequence, a reduction of the....
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