Automated Ion-Plasma Coating System MAP-3 — National Research Center "Kurchatov Institute" - VIAM

Name: Automated Ion-Plasma Coating System MAP-3
Brand: MAP-3
SKU: 463226
Availability: InStock

برند: MAP-3

﷼ 3,780,000,000 - ﷼ 15,120,000,000 IRR

MOQ: 1 pieces

ویژگی‌های کلیدی

Number of pieces to be processed simultaneously: 12...24 pcs

Installed capacity: 95 kW

Speed of coating condensation on the substrate, not more, ?m/min: 0.35

Chamber pressure during product cleaning with gas-discharge ion source: 0.04...0.053

اطلاعات تأمین‌کننده

National Research Center "Kurchatov Institute" - VIAM

🇷🇺 📦 🏭 🛡️

مشاهده همه محصولات (47)

استعلام سریع

توضیحات

The unit is designed for application of heat-resistant, corrosion-resistant, erosion-resistant, wear-resistant coatings on turbine and compressor blades of GTE, hard coatings from metal compounds on cutting tools and parts of GTE, including assisted deposition, and also allows to carry out ion etching and ion saturation of the treated surface with metal ions.

مشخصات

Number of pieces to be processed simultaneously

12...24 pcs

Installed capacity

95 kW

Speed of coating condensation on the substrate, not more, ?m/min

0.35

Chamber pressure during product cleaning with gas-discharge ion source

0.04...0.053

Pressure in the chamber during coating: metallic

0.0266...0.00665

Pressure in the chamber during coating: cermet coating

0.266...0.1064

Pumping duration up to working pressure of 0.0266 Pa, not more than

Cooling water flow rate

5...8

Overall dimensions of the installation (dxhxv), not more than

4700 x 2500 x 2850 mm

Maximum dimensions of the spraying area on the workpiece, not more, (diameter × height)

125 x 200 mm

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Automated Ion-Plasma Coating System MAP-3 — National Research Center "Kurchatov Institute" - VIAM

ویژگی‌های کلیدی

توضیحات

مشخصات

محصولات مشابه

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Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29

Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader

High-Density Coating Application System NIKA-15101

Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01

Vacuum Coating System UVN-71P-3M-1

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Vacuum Installation for Gateway Systems UВШ КВПА.702311.007

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