Individual or group processing of wafers or wafers on the planetary wafer holder in one technological cycle: 60x48, Ø76mm, Ø100mm, Ø150mm;
Multicathode MRU with four Ø76mm targets;
Sluice chamber for loading and unloading of wafers;
Planetary two-stage substrate holder;
Preheating of substrates and their cleaning with the help of ion source in the airlock;
Application of films in the working chamber by one, two, three, four magnetrons;
Oil-free pumping system;
Consumption power not more than 20 kW;
Possibility to build in the clean room.
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