Тауарлар — Вакуумды бүрку және плазмохимия қондырғылары
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
₸42,750,000-171,000,000
NIITM OJSC 🇷🇺
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
₸42,750,000-142,500,000
NIITM OJSC 🇷🇺
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
₸42,750,000-171,000,000
NIITM OJSC 🇷🇺
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
₸42,750,000-142,500,000
NIITM OJSC 🇷🇺
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
₸7,125,000-22,800,000
NIITM OJSC 🇷🇺
Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
₸42,750,000-142,500,000
NIITM OJSC 🇷🇺
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
₸42,750,000-171,000,000
NIITM OJSC 🇷🇺
Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01
₸42,750,000-142,500,000
NIITM OJSC 🇷🇺
