The electrodeless radio-frequency plasma generator is designed to create and maintain gas-discharge low-temperature plasma in the working volumes of vacuum process units in continuous mode and is used in:
- material sputtering in plasma of inert or chemically active gases
- ion and plasma chemical etching
- evaporation, with additional vapour ionisation
- plasma-stimulated vapour deposition
- ionic surface modification (oxidation, reduction, nitriding, carbidisation)
- ionic cleaning and assisted
- high-temperature annealing
The RPG-250 is equipped with:
- flat coil
- removable quartz glass shield to protect the working surface
- coaxial input with shank for connection to RF power source
*Operational Manual is available on request: LCMK.208.00.00.00.00.000 RE Radiofrequency Plasma Generator RPG-250
It is allowed to deliver the device as a part of the installation without packing.
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