Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
US$90,000-360,000
Length:
3200
Width:
1600
NIITM OJSC 🇷🇺
Anisotropic Plasma Etching System for Silicon Plates up to 200 mm – ESTOХORS
US$90,000-360,000
Length:
1200
Width:
600
ESTO OJSC 🇷🇺
